Reactive magnetron deposition and characterization of ZrN thin films for decorative and field emission applications

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dc.contributor.advisorNdwandwe, O.M.
dc.contributor.authorNyawo, Thembinkosi Goodman
dc.date.accessioned2013-09-30T10:40:13Z
dc.date.available2013-09-30T10:40:13Z
dc.date.issued2012
dc.descriptionA dissertation submitted to the Faculty of Science in fulfilment of the requirements for the degree of Master of Science in the Department of Physics and Engineering at the University of Zululand, South Africa, 2012.en_US
dc.description.abstractZirconium nitrite (ZrN) films were deposited on substrates of Si<100>, Aluminium strip, brass strips and glass, by DC magnetron sputtering system under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature, and were characterized by SEM/EDX, AFM, Colour photospectrometer, RBS and resonant RBS. The films were found to be transparent and semiconducting. They tended to absorb oxygen. The films were found to adhere well to the substrates. The colours of the films varied depending on deposition conditions and have been expressed in the colour space. Potential uses of such films are as protective hard coatings as well as decorative layers. Carbon nanotubes (CNTs) were synthesized on ZrN, Al2O3, Si (100) and Al2O3/Si (100) substrates by means of sputtering under varying conditions of acetylene and hydrogen gas flow rates, deposition time as well as temperature. The carbon nanotubes were grown successful on zirconium nitride as well as aluminium oxide films with help of metal catalyst, Fe.en_US
dc.description.sponsorshipNRF and University of Zululand.en_US
dc.identifier.urihttps://hdl.handle.net/10530/1272
dc.language.isoenen_US
dc.publisherUniversity of Zululanden_US
dc.subjectZirconium nitriteen_US
dc.titleReactive magnetron deposition and characterization of ZrN thin films for decorative and field emission applicationsen_US
dc.typeThesisen_US
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